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Ingredients for Neutrogena Deep Clean Purifying Clay Face Mask, 4.2 OZ



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Ingredients

Active Ingredients: Salicylic Acid 0.5%, Purpose: Acne Treatment


Inactive Ingredients: Water, Glycerin, Kaolin, Bentonite, Sodium Methyl Cocoyl Taurate, Trideceth-9, Peg-5 Ethylhexanoate, Xanthan Gum, Glycolic Acid, Citric Acid, Menthyl Lactate, Panthenol, SodiumHydroxide, Fragrance, Sodium Citrate, Disodium Edta, Titanium Dioxide, Green 3.